The graphene/n-Ge(110) interface: structure, doping, and electronic properties. Issue 13 (16th March 2018)
- Record Type:
- Journal Article
- Title:
- The graphene/n-Ge(110) interface: structure, doping, and electronic properties. Issue 13 (16th March 2018)
- Main Title:
- The graphene/n-Ge(110) interface: structure, doping, and electronic properties
- Authors:
- Tesch, Julia
Paschke, Fabian
Fonin, Mikhail
Wietstruk, Marko
Böttcher, Stefan
Koch, Roland J.
Bostwick, Aaron
Jozwiak, Chris
Rotenberg, Eli
Makarova, Anna
Paulus, Beate
Voloshina, Elena
Dedkov, Yuriy - Abstract:
- Abstract : Synthesis temperature and substrate doping are key factors which determine the properties of graphene on semiconducting Ge(110). Abstract : The implementation of graphene in semiconducting technology requires precise knowledge about the graphene–semiconductor interface. In our work the structure and electronic properties of the graphene/n-Ge(110) interface are investigated on the local (nm) and macro (from μm to mm) scales via a combination of different microscopic and spectroscopic surface science techniques accompanied by density functional theory calculations. The electronic structure of freestanding graphene remains almost completely intact in this system, with only a moderate n-doping indicating weak interaction between graphene and the Ge substrate. With regard to the optimisation of graphene growth it is found that the substrate temperature is a crucial factor, which determines the graphene layer alignment on the Ge(110) substrate during its growth from the atomic carbon source. Moreover, our results demonstrate that the preparation route for graphene on the doped semiconducting material (n-Ge) leads to the effective segregation of dopants at the interface between graphene and Ge(110). Furthermore, it is shown that these dopant atoms might form regular structures at the graphene/Ge interface and induce the doping of graphene. Our findings help to understand the interface properties of the graphene–semiconductor interfaces and the effect of dopants on theAbstract : Synthesis temperature and substrate doping are key factors which determine the properties of graphene on semiconducting Ge(110). Abstract : The implementation of graphene in semiconducting technology requires precise knowledge about the graphene–semiconductor interface. In our work the structure and electronic properties of the graphene/n-Ge(110) interface are investigated on the local (nm) and macro (from μm to mm) scales via a combination of different microscopic and spectroscopic surface science techniques accompanied by density functional theory calculations. The electronic structure of freestanding graphene remains almost completely intact in this system, with only a moderate n-doping indicating weak interaction between graphene and the Ge substrate. With regard to the optimisation of graphene growth it is found that the substrate temperature is a crucial factor, which determines the graphene layer alignment on the Ge(110) substrate during its growth from the atomic carbon source. Moreover, our results demonstrate that the preparation route for graphene on the doped semiconducting material (n-Ge) leads to the effective segregation of dopants at the interface between graphene and Ge(110). Furthermore, it is shown that these dopant atoms might form regular structures at the graphene/Ge interface and induce the doping of graphene. Our findings help to understand the interface properties of the graphene–semiconductor interfaces and the effect of dopants on the electronic structure of graphene in such systems. … (more)
- Is Part Of:
- Nanoscale. Volume 10:Issue 13(2018)
- Journal:
- Nanoscale
- Issue:
- Volume 10:Issue 13(2018)
- Issue Display:
- Volume 10, Issue 13 (2018)
- Year:
- 2018
- Volume:
- 10
- Issue:
- 13
- Issue Sort Value:
- 2018-0010-0013-0000
- Page Start:
- 6088
- Page End:
- 6098
- Publication Date:
- 2018-03-16
- Subjects:
- Nanoscience -- Periodicals
Nanotechnology -- Periodicals
620.505 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/NR/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c8nr00053k ↗
- Languages:
- English
- ISSNs:
- 2040-3364
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9830.266000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 6052.xml