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HARVARD Citation
Liu, A. et al. (2018). Impurity Gettering by Atomic‐Layer‐Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures (Phys. Status Solidi RRL 3/2018). Physica status solidi. 12 (3), p. n/a. [Online].
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Liu, A. et al. (2018). Impurity Gettering by Atomic‐Layer‐Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures (Phys. Status Solidi RRL 3/2018). Physica status solidi. 12 (3), p. n/a. [Online].