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HARVARD Citation
Borah, D. et al. (2015). Soft Graphoepitaxy for Large Area Directed Self‐Assembly of Polystyrene‐block‐Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography. Advanced functional materials. pp. 3425-3432. [Online].