Numerical simulation and experimental verification of vacuum directional solidification process for multicrystalline silicon. (June 2015)
- Record Type:
- Journal Article
- Title:
- Numerical simulation and experimental verification of vacuum directional solidification process for multicrystalline silicon. (June 2015)
- Main Title:
- Numerical simulation and experimental verification of vacuum directional solidification process for multicrystalline silicon
- Authors:
- Lv, Guoqiang
Chen, Daotong
Yang, Xi
Ma, Wenhui
Luo, Tao
Wei, Kuixianai
Zhou, Yang - Abstract:
- Abstract: In this paper, a transient numerical model was applied to simulate the vacuum directional solidification (VDS) process of multicrystalline silicon (mc-Si) under different pulling-down rates, and the evolution of temperature distribution, thermal stresses and shape of solid/liquid (s/l) interface were simulated and analyzed. The experiments, such as the content and distribution of metal impurity, the crystal growth orientation and quality of mc-Si ingot were investigated to evaluate and validate the relationship between the thermal stresses and shape of s/l interface with simulation results. The results show that thermal stress, shape of interface s/l and temperature distribution in the silicon is determined by the thermal conditions in the furnace during the VDS process, and the crystal growth quality of mc-Si ingot relates closely to these factors. An appropriate pulling-down rate can satisfy thermal conditions to provide ideal temperature gradient in the silicon with lower thermal stresses and suitable s/l interface. We found that the mc-Si ingot produced by VDS process with pulling-down rate of 10 μm s −1 had a larger grain size, a vertical columnar structure and an ideal efficiency of the impurity removal. Highlights: Investigations into vacuum directional solidification process for multicrystalline silicon were conducted. Proper thermal condition for high-quality crystal production can be obtained by adjusting the growth rate. The simulation and experimentalAbstract: In this paper, a transient numerical model was applied to simulate the vacuum directional solidification (VDS) process of multicrystalline silicon (mc-Si) under different pulling-down rates, and the evolution of temperature distribution, thermal stresses and shape of solid/liquid (s/l) interface were simulated and analyzed. The experiments, such as the content and distribution of metal impurity, the crystal growth orientation and quality of mc-Si ingot were investigated to evaluate and validate the relationship between the thermal stresses and shape of s/l interface with simulation results. The results show that thermal stress, shape of interface s/l and temperature distribution in the silicon is determined by the thermal conditions in the furnace during the VDS process, and the crystal growth quality of mc-Si ingot relates closely to these factors. An appropriate pulling-down rate can satisfy thermal conditions to provide ideal temperature gradient in the silicon with lower thermal stresses and suitable s/l interface. We found that the mc-Si ingot produced by VDS process with pulling-down rate of 10 μm s −1 had a larger grain size, a vertical columnar structure and an ideal efficiency of the impurity removal. Highlights: Investigations into vacuum directional solidification process for multicrystalline silicon were conducted. Proper thermal condition for high-quality crystal production can be obtained by adjusting the growth rate. The simulation and experimental results were in accord with each other. … (more)
- Is Part Of:
- Vacuum. Volume 116(2015)
- Journal:
- Vacuum
- Issue:
- Volume 116(2015)
- Issue Display:
- Volume 116, Issue 2015 (2015)
- Year:
- 2015
- Volume:
- 116
- Issue:
- 2015
- Issue Sort Value:
- 2015-0116-2015-0000
- Page Start:
- 96
- Page End:
- 103
- Publication Date:
- 2015-06
- Subjects:
- Numerical simulation -- Vacuum directional solidification -- Multicrystalline silicon
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2015.03.009 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
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