Cite
HARVARD Citation
Chaudhry, A. et al. (2018). Corrosion mechanism in PVD deposited nano-scale titanium nitride thin film with intercalated titanium for protecting the surface of silicon. Electrochimica acta. pp. 69-82. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Chaudhry, A. et al. (2018). Corrosion mechanism in PVD deposited nano-scale titanium nitride thin film with intercalated titanium for protecting the surface of silicon. Electrochimica acta. pp. 69-82. [Online].