Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods. (1st January 2014)

• Record Type: Journal Article
• Authors: Zhang, Liqiang; Xu, Chaoyan; Tang, Yunqing
• Is Part Of: International journal of materials and structural integrity. Volume 8:Number 4(2014)
• Page Start: 303
• Page End: 309
• Publication Date: 2014-01-01
• Subjects: Cu nano-thin films -- experimental preparation -- growth rate; Materials -- Testing -- Periodicals; Strength of materials -- Periodicals; Structural dynamics -- Periodicals; Structural analysis (Engineering) -- Periodicals; 620.112
• DOI: 10.1504/IJMSI.2014.067117
• Languages: English
• ISSNs: 1745-0055

Abstract

The growth rate of the Cu nano-thin film was investigated based on the magnetron sputtering method under different process parameters and different sputtering method. Firstly, some samples of Cu nano-thin films were sputtered on the glass substrate by changing different sputtering power at the direct current (DC) magnetron sputtering method. Secondly, some Cu nano-thin film samples were prepared by using the DC magnetron sputtering method and radio frequency (RF) magnetron sputtering methods. The thickness of the Cu nano-thin film was test by the film thickness gauge, and then the growth rate of the Cu nano-thin film was obtained. These results show that the sputtering power is very important for the growth rate. The growth rate of the Cu nano-thin film increases with the increase of the sputtering power at the DC magnetron sputtering method; the growth rate of the Cu nano-thin film prepared under the DC magnetron sputtering method is about ten times of that prepared under the RF magnetron sputtering method.