Cite
HARVARD Citation
Shin, E. et al. (2018). A High‐k Fluorinated P(VDF‐TrFE)‐g‐PMMA Gate Dielectric for High‐Performance Flexible Field‐Effect Transistors. Advanced functional materials. p. n/a. [Online].
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Shin, E. et al. (2018). A High‐k Fluorinated P(VDF‐TrFE)‐g‐PMMA Gate Dielectric for High‐Performance Flexible Field‐Effect Transistors. Advanced functional materials. p. n/a. [Online].