Cite
HARVARD Citation
Zheng, L. et al. (2015). Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition. Physical chemistry chemical physics. 17 (5), pp. 3179-3185. [Online].
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Zheng, L. et al. (2015). Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition. Physical chemistry chemical physics. 17 (5), pp. 3179-3185. [Online].