Cite
HARVARD Citation
Nordell, B. et al. (2017). Carbon‐Enriched Amorphous Hydrogenated Boron Carbide Films for Very‐Low‐k Interlayer Dielectrics. Advanced Electronic Materials. p. n/a. [Online].
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Nordell, B. et al. (2017). Carbon‐Enriched Amorphous Hydrogenated Boron Carbide Films for Very‐Low‐k Interlayer Dielectrics. Advanced Electronic Materials. p. n/a. [Online].