Creation and behavior of radicals and ions in the Acetylene/Argon microwave ECR discharge. Issue 12 (10th July 2017)

• Record Type: Journal Article
• Authors: Pokorný, Petr; Musil, Jindřich; Novotný, Michal; Lančok, Ján; Fitl, Přemysl; Vlček, Jan
• Is Part Of: Plasma processes and polymers. Volume 14:Issue 12(2017)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2017-07-10
• Subjects: acetylene -- ECR discharge -- ions -- mass spectrometry -- radicals; Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201700062
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract : Formation and number of molecules, radicals, and ions in ECR acetylene/argon discharge is studied as functions of gas flow rate, supplied power, and partial pressure of acetylene. The spectra obtained by neutral mass spectrometry (NMS) exhibit the presence of atomic hydrogen and H2 molecules. The quantity of acetylene ions is rather high in the range of power up to 350 W, but it drops down with increasing power. At higher powers, the change to C2 H + ion takes place and its quantity grows with increasing power. The dependence of the number of C2 +, C2 H +, C2 H2 + on the electron energy is judged by appearance potential mass spectrometry in the energy range 0–100 eV. The obtained findings are useful for the technology of industrial preparation of DLC thin films. Abstract : We present plasma study of microwave ECR discharge in acetylene for processes of DLC film synthesis. The process of hydrogen loss from the acetylene molecule is study by neutral mass spectroscopy. For discharge powers up to 350 W acetylene molecules are significantly present. Formation of C2 H2 + and C2 H + ions in discharge above 350 W of power is discover by appearance potential mass spectrometry.