Thermoelectric characteristics of Pt-silicide/silicon multi-layer structured p-type silicon. (15th March 2015)
- Record Type:
- Journal Article
- Title:
- Thermoelectric characteristics of Pt-silicide/silicon multi-layer structured p-type silicon. (15th March 2015)
- Main Title:
- Thermoelectric characteristics of Pt-silicide/silicon multi-layer structured p-type silicon
- Authors:
- Choi, Wonchul
Jun, Dongseok
Kim, Soojung
Shin, Mincheol
Jang, Moongyu - Abstract:
- Abstract: Electric and thermoelectric properties of silicide/silicon multi-layer structured devices were investigated with the variation of silicide/silicon heterojunction numbers from 3 to 12 layers. For the fabrication of silicide/silicon multi-layered structure, platinum and silicon layers are repeatedly sputtered on the (100) silicon bulk substrate and rapid thermal annealing is carried out for the silicidation. The manufactured devices show ohmic current–voltage (I–V) characteristics. The Seebeck coefficient of bulk Si is evaluated as 195.8 ± 15.3 μV/K at 300 K, whereas the 12 layered silicide/silicon multi-layer structured device is evaluated as 201.8 ± 9.1 μV/K. As the temperature increases to 400 K, the Seebeck coefficient increases to 237.2 ± 4.7 μV/K and 277.0 ± 1.1 μV/K for bulk and 12 layered devices, respectively. The increase of Seebeck coefficient in multi-layered structure is mainly attributed to the electron filtering effect due to the Schottky barrier at Pt-silicide/silicon interface. At 400 K, the thermal conductivity is reduced by about half of magnitude compared to bulk in multi-layered device which shows the efficient suppression of phonon propagation by using Pt-silicide/silicon hetero-junctions. Highlights: Silicide/silicon multi-layer structured is proposed for thermoelectric devices. Electric and thermoelectric properties with the number of layer are investigated. An increase of Seebeck coefficient is mainly attributed the Schottky barrier. PhononAbstract: Electric and thermoelectric properties of silicide/silicon multi-layer structured devices were investigated with the variation of silicide/silicon heterojunction numbers from 3 to 12 layers. For the fabrication of silicide/silicon multi-layered structure, platinum and silicon layers are repeatedly sputtered on the (100) silicon bulk substrate and rapid thermal annealing is carried out for the silicidation. The manufactured devices show ohmic current–voltage (I–V) characteristics. The Seebeck coefficient of bulk Si is evaluated as 195.8 ± 15.3 μV/K at 300 K, whereas the 12 layered silicide/silicon multi-layer structured device is evaluated as 201.8 ± 9.1 μV/K. As the temperature increases to 400 K, the Seebeck coefficient increases to 237.2 ± 4.7 μV/K and 277.0 ± 1.1 μV/K for bulk and 12 layered devices, respectively. The increase of Seebeck coefficient in multi-layered structure is mainly attributed to the electron filtering effect due to the Schottky barrier at Pt-silicide/silicon interface. At 400 K, the thermal conductivity is reduced by about half of magnitude compared to bulk in multi-layered device which shows the efficient suppression of phonon propagation by using Pt-silicide/silicon hetero-junctions. Highlights: Silicide/silicon multi-layer structured is proposed for thermoelectric devices. Electric and thermoelectric properties with the number of layer are investigated. An increase of Seebeck coefficient is mainly attributed the Schottky barrier. Phonon propagation is suppressed with the existence of Schottky barrier. Thermal conductivity is reduced due to the suppression of phonon propagation. … (more)
- Is Part Of:
- Energy. Volume 82(2015)
- Journal:
- Energy
- Issue:
- Volume 82(2015)
- Issue Display:
- Volume 82, Issue 2015 (2015)
- Year:
- 2015
- Volume:
- 82
- Issue:
- 2015
- Issue Sort Value:
- 2015-0082-2015-0000
- Page Start:
- 180
- Page End:
- 183
- Publication Date:
- 2015-03-15
- Subjects:
- Thermoelectric -- Silicide -- Silicon -- Multi-layer -- Seebeck
Power resources -- Periodicals
Power (Mechanics) -- Periodicals
Energy consumption -- Periodicals
333.7905 - Journal URLs:
- http://www.elsevier.com/journals ↗
- DOI:
- 10.1016/j.energy.2015.01.024 ↗
- Languages:
- English
- ISSNs:
- 0360-5442
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3747.445000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 5516.xml