Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing. Issue 5 (20th November 2017)

• Record Type: Journal Article
• Authors: Granik, Yuri; Torres, Andres
• Is Part Of: Molecular Systems Design and Engineering. Volume 2:Issue 5(2017)
• Page Start: 605
• Page End: 615
• Publication Date: 2017-11-20
• Subjects: Chemistry -- Molecular aspects -- Periodicals; Chemical engineering -- Molecular aspects -- Periodicals; Nanotechnology -- Periodicals; 620.5
• DOI: 10.1039/c7me00066a
• Languages: English
• ISSNs: 2058-9689

Abstract

Abstract : To realize the full benefit of directed self-assembly (DSA), it is necessary to understand the interplay between the target structures and the process parameters. Abstract : To realize the full benefit of directed self-assembly (DSA), it is necessary to understand the interplay between the target structures and the process parameters. In this paper, we cover the reasons as to why a compact model and model-based synthesis are required for graphoepitaxial DSA of cylinder forming block copolymers.