Spectroscopic Indications of Tunnel Barrier Charging as the Switching Mechanism in Memristive Devices. (10th October 2017)
- Record Type:
- Journal Article
- Title:
- Spectroscopic Indications of Tunnel Barrier Charging as the Switching Mechanism in Memristive Devices. (10th October 2017)
- Main Title:
- Spectroscopic Indications of Tunnel Barrier Charging as the Switching Mechanism in Memristive Devices
- Authors:
- Arndt, Benedikt
Borgatti, Francesco
Offi, Francesco
Phillips, Monifa
Parreira, Pedro
Meiners, Thorsten
Menzel, Stephan
Skaja, Katharina
Panaccione, Giancarlo
MacLaren, Donald A.
Waser, Rainer
Dittmann, Regina - Abstract:
- Abstract: Resistive random access memory is a promising, energy‐efficient, low‐power "storage class memory" technology that has the potential to replace both flash storage and on‐chip dynamic memory. While the most widely employed systems exhibit filamentary resistive switching, interface‐type switching systems based on a tunable tunnel barrier are of increasing interest. They suffer less from the variability induced by the stochastic filament formation process and the choice of the tunnel barrier thickness offers the possibility to adapt the memory device current to the given circuit requirements. Heterostructures consisting of a yttria‐stabilized zirconia (YSZ) tunnel barrier and a praseodymium calcium manganite (PCMO) layer are employed. Instead of spatially localized filaments, the resistive switching process occurs underneath the whole electrode. By employing a combination of electrical measurements, in operando hard X‐ray photoelectron spectroscopy and electron energy loss spectroscopy, it is revealed that an exchange of oxygen ions between PCMO and YSZ causes an electrostatic modulation of the effective height of the YSZ tunnel barrier and is thereby the underlying mechanism for resistive switching in these devices. Abstract : In operando hard X‐ray photoelectron spectroscopy and electron energy loss spectroscopy is employed on praseodymium calcium manganite memristive devices with a yttria‐stabilized zirconia tunnel barrier. The analyses reveal that the exchange ofAbstract: Resistive random access memory is a promising, energy‐efficient, low‐power "storage class memory" technology that has the potential to replace both flash storage and on‐chip dynamic memory. While the most widely employed systems exhibit filamentary resistive switching, interface‐type switching systems based on a tunable tunnel barrier are of increasing interest. They suffer less from the variability induced by the stochastic filament formation process and the choice of the tunnel barrier thickness offers the possibility to adapt the memory device current to the given circuit requirements. Heterostructures consisting of a yttria‐stabilized zirconia (YSZ) tunnel barrier and a praseodymium calcium manganite (PCMO) layer are employed. Instead of spatially localized filaments, the resistive switching process occurs underneath the whole electrode. By employing a combination of electrical measurements, in operando hard X‐ray photoelectron spectroscopy and electron energy loss spectroscopy, it is revealed that an exchange of oxygen ions between PCMO and YSZ causes an electrostatic modulation of the effective height of the YSZ tunnel barrier and is thereby the underlying mechanism for resistive switching in these devices. Abstract : In operando hard X‐ray photoelectron spectroscopy and electron energy loss spectroscopy is employed on praseodymium calcium manganite memristive devices with a yttria‐stabilized zirconia tunnel barrier. The analyses reveal that the exchange of oxygen ions at the interface causes an electrostatic modulation of the effective tunnel barrier height and can thereby be regarded as the underlying mechanism for resistive switching in these devices. … (more)
- Is Part Of:
- Advanced functional materials. Volume 27:Number 45(2017)
- Journal:
- Advanced functional materials
- Issue:
- Volume 27:Number 45(2017)
- Issue Display:
- Volume 27, Issue 45 (2017)
- Year:
- 2017
- Volume:
- 27
- Issue:
- 45
- Issue Sort Value:
- 2017-0027-0045-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-10-10
- Subjects:
- HAXPES -- PCMO -- resistive switching -- STEM‐EELS -- tunnel ReRAM
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201702282 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 5427.xml