Characteristic diffuse scattering from distinct line roughnesses. Issue 6 (20th November 2017)

• Record Type: Journal Article
• Authors: Fernández Herrero, Analía; Pflüger, Mika; Probst, Jürgen; Scholze, Frank; Soltwisch, Victor
• Is Part Of: Journal of applied crystallography. Volume 50:Issue 6(2017)
• Page Start: 1766
• Page End: 1772
• Publication Date: 2017-11-20
• Subjects: EUV scatterometry -- line edge roughness -- line width roughness -- resonance diffuse scattering; Crystallography -- Periodicals; 548.05
• DOI: 10.1107/S1600576717014455
• Languages: English
• ISSNs: 0021-8898

Abstract

Abstract : The impact of the edge roughness of laterally periodic nanostructures on the scattering pattern is investigated. The applicability of existing analytical approaches for the description of real samples is discussed. Abstract : Lamellar gratings are widely used diffractive optical elements; gratings etched into Si can be used as structural elements or prototypes of structural elements in integrated electronic circuits. For the control of the lithographic manufacturing process, a rapid in‐line characterization of nanostructures is indispensable. Numerous studies on the determination of regular geometry parameters of lamellar gratings from optical and extreme ultraviolet (EUV) scattering highlight the impact of roughness on the optical performance as well as on the reconstruction of these structures. Thus, a set of nine lamellar Si gratings with a well defined line edge roughness or line width roughness were designed. The investigation of these structures using EUV small‐angle scattering reveals a strong correlation between the type of line roughness and the angular scattering distribution. These distinct scattering patterns open new paths for the unequivocal characterization of such structures by EUV scatterometry.