Advanced analysis of copper X‐ray photoelectron spectra. (12th May 2017)

• Record Type: Journal Article
• Authors: Biesinger, Mark C.
• Other Names: Nie Heng‐Yong guestEditor.; McIntyre N. Stewart guestEditor.
• Is Part Of: Surface and interface analysis. Volume 49:Number 13(2017)
• Page Start: 1325
• Page End: 1334
• Publication Date: 2017-05-12
• Subjects: copper -- XPS -- X‐ray photoelectron spectroscopy -- peak‐fitting -- oxides -- Auger -- Wagner plot; Surfaces (Physics) -- Periodicals; Surface chemistry -- Periodicals; Thin films -- Periodicals; 541.33
• DOI: 10.1002/sia.6239
• Languages: English
• ISSNs: 0142-2421

Abstract

Abstract : Chemical state X‐ray photoelectron spectroscopic analysis of copper species is challenging because of the complexity of the 2p spectra resulting from shake‐up structures for Cu(II) species and overlapping binding energies for Cu metal and Cu(I) species. This paper builds upon and extends previously published X‐ray photoelectron spectroscopy curve‐fitting and data analysis procedures for a wide range of copper containing species. Steps undertaken include the following: (i) an examination of existing Cu 2p3/2 main peak and Cu 2p3/2 – Cu L3 M4, 5 M4, 5 Auger parameter literature data, (ii) analysis of a series of quality standard samples, (iii) curve‐fitting procedures for both the Cu 2p3/2 and the Cu L3 M4, 5 M4, 5 spectra (as well as associated anions), (iv) calculations that determine the amount of Cu(II) species in a mixed oxidation state system, (v) calculations and necessary data for thin film mixed oxide/hydroxide thickness measurements, and (vi) a presentation of literature and standard sample values in a Wagner (chemical state) plot. Copyright © 2017 John Wiley & Sons, Ltd.