High efficient and wide-angle solar absorption with a multilayered metal-dielectric film structure. (December 2017)

• Record Type: Journal Article
• Authors: Hu, Er-Tao; Guo, Shuai; Gu, Tong; Zang, Kai-Yan; Tu, Hua-Tian; Cai, Qing-Yuan; Yu, Ke-Han; Wei, Wei; Zheng, Yu-Xiang; Wang, Song-You; Zhang, Rong-Jun; Lee, Young-Pak; Chen, Liang-Yao
• Is Part Of: Vacuum. Volume 146(2017)
• Page Start: 194
• Page End: 199
• Publication Date: 2017-12
• Subjects: Metal-dielectric film structure -- Solar absorption -- Thermal emittance -- Solar-thermal conversion; Vacuum -- Periodicals; 621.55
• DOI: 10.1016/j.vacuum.2017.09.051
• Languages: English
• ISSNs: 0042-207X

Abstract

Abstract: A typical 6-layered metal-dielectric film structure of SiO2 (57.3 nm)/Cr (2.9 nm)/SiO2 (72.9 nm)/Cr (6.6 nm)/SiO2 (57.6 nm)/Cu (>100.0 nm) was designed and fabricated by magnetron sputtering. It showed a high solar absorption of about 95.8% in the wavelength range of 250–2000 nm, a low thermal emittance of about 0.104 at 600 K and good thermal stability at 673 K after annealing for 12 h in vacuum condition. The angle-dependent reflectance spectra indicated that the proposed 6-layered film structure has a great angular tolerance even when the incident angle increases to 50°. All of the excellent spectral properties and good thermal stability demonstrate the 6- layered planar film structure will be suitable for practical applications of solar-thermal conversion. Highlights: A nano-Cr-film based 6 layered metal/dielectric film structure was designed and fabricated. The solar absorption in the near ultraviolet region of 250–400 nm was enhanced. The film structure presents excellent spectral absorptivity over a wide angular range. The film structure exhibits a good thermal stability after annealing for 12 h at 673 K in the vacuum of 49 mTorr.