Cite
HARVARD Citation
Scharf, I. et al. (n.d.). Calculation approach for current–potential behaviour during pulse electrodeposition based on double-layer characteristics. Transactions of the Institute of Metal Finishing. pp. 325-335. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Scharf, I. et al. (n.d.). Calculation approach for current–potential behaviour during pulse electrodeposition based on double-layer characteristics. Transactions of the Institute of Metal Finishing. pp. 325-335. [Online].