Study of nanostructured Al doped ZnO films. (July 2013)

• Record Type: Journal Article
• Authors: Rahman, A.; Jayaganthan, R.; Jain, R. K.; Chawla, A. K.; Chandra, R.; Ambardar, R.
• Is Part Of: Surface engineering. Volume 29:Number 6(2013)
• Page Start: 440
• Page End: 446
• Publication Date: 2013-07
• Subjects: Spectrophotometer -- FESEM -- XRD -- Transmittance; Surfaces (Technology) -- Periodicals; Coatings -- Periodicals; 620.4405
• DOI: 10.1179/1743294413Y.0000000140
• Languages: English
• ISSNs: 0267-0844

Abstract

Abstract : Electroless Al doped ZnO nanostructured thin films were deposited on soda lime glass in the present work. The wet deposited films were dried in air and subsequently annealed in a muffle furnace in air environment. The film deposited samples were characterised by field emission SEM/energy dispersive spectroscopy, X-ray diffraction and ultraviolet-visible spectrophotometer. Microstructure of the Al doped ZnO film is strongly affected by increasing the deposition time and annealing temperature. Surface and cross-sectional morphology of Al doped ZnO film exhibited the dense microstructure as compared to undoped ZnO films. X-ray analysis shows a (101) preferential growth in all the films. The optical properties of the films were analysed in the spectral range of 300–800 nm. The obtained samples are highly transparent with a visual transmittance of >80% at 450 nm.