Deposition of ZrNxOy films by filtered cathodic vacuum arc. (September 2013)

• Record Type: Journal Article
• Authors: Chen, Y M; Zhang, H Q; Li, Z W; Cao, W; Liao, B; Zhang, X
• Is Part Of: Surface engineering. Volume 29:Number 8(2013)
• Page Start: 567
• Page End: 571
• Publication Date: 2013-09
• Subjects: Filtered cathodic vacuum arc -- ZrNxOy films -- Band gap -- Refractive index -- Mechanical property; Surfaces (Technology) -- Periodicals; Coatings -- Periodicals; 620.4405
• DOI: 10.1179/1743294413Y.0000000163
• Languages: English
• ISSNs: 0267-0844

Abstract

Abstract : Zirconium oxynitride (ZrNx Oy ) thin films were prepared by filtered cathodic vacuum arc technique using N2 /O2 mixtures. The effect of N2 /O2 ratios on the microstructure, optical and mechanical properties of films had been investigated. X-ray diffraction results showed that o-Zr3 N4 (O) phase was observed at low oxygen flowrate, while tetragonal and monoclinic phases of ZrO2 were detected at high one. Optical test revealed that the films changed from semitransparent to transparent, and the absorption edge shifted to lower wavelength with the increase in oxygen flowrate. The refractive indexes of films ranged from 2·24 to 3·47, and the optical band gap increased from 2·06 to 4 eV with the increasing oxygen content, which implied that the films had potentials in optoelectronic applications.