Characterization of Edge Contact: Atomically Resolved Semiconductor–Metal Lateral Boundary in MoS2. Issue 41 (18th September 2017)
- Record Type:
- Journal Article
- Title:
- Characterization of Edge Contact: Atomically Resolved Semiconductor–Metal Lateral Boundary in MoS2. Issue 41 (18th September 2017)
- Main Title:
- Characterization of Edge Contact: Atomically Resolved Semiconductor–Metal Lateral Boundary in MoS2
- Authors:
- Kwon, Hyeokshin
Lee, Kiyoung
Heo, Jinseong
Oh, Youngtek
Lee, Hyangsook
Appalakondaiah, Samudrala
Ko, Wonhee
Kim, Hyo Won
Jung, Jin‐Wook
Suh, Hwansoo
Min, Hongki
Jeon, Insu
Hwang, Euyheon
Hwang, Sungwoo - Abstract:
- Abstract: Despite recent efforts for the development of transition‐metal‐dichalcogenide‐based high‐performance thin‐film transistors, device performance has not improved much, mainly because of the high contact resistance at the interface between the 2D semiconductor and the metal electrode. Edge contact has been proposed for the fabrication of a high‐quality electrical contact; however, the complete electronic properties for the contact resistance have not been elucidated in detail. Using the scanning tunneling microscopy/spectroscopy and scanning transmission electron microscopy techniques, the edge contact, as well as the lateral boundary between the 2D semiconducting layer and the metalized interfacial layer, are investigated, and their electronic properties and the energy band profile across the boundary are shown. The results demonstrate a possible mechanism for the formation of an ohmic contact in homojunctions of the transition‐metal dichalcogenides semiconductor–metal layers and suggest a new device scheme utilizing the low‐resistance edge contact. Abstract : The edge contact and the lateral boundary between a semiconducting layer and a metalized interfacial layer are investigated using scanning tunneling microscopy/spectroscopy and scanning transmission electron microscopy techniques. The electronic properties and the energy band profile across the boundary are shown. A new device scheme based on the low‐resistance edge contact is thus provided.
- Is Part Of:
- Advanced materials. Volume 29:Issue 41(2017)
- Journal:
- Advanced materials
- Issue:
- Volume 29:Issue 41(2017)
- Issue Display:
- Volume 29, Issue 41 (2017)
- Year:
- 2017
- Volume:
- 29
- Issue:
- 41
- Issue Sort Value:
- 2017-0029-0041-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-09-18
- Subjects:
- edge contact -- semiconductor–metal boundary -- scanning tunneling microscopy (STM) -- transition‐metal dichalcogenides
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adma.201702931 ↗
- Languages:
- English
- ISSNs:
- 0935-9648
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.897800
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 5073.xml