Barrierless Cu–Ni–Nb thin films on silicon with high thermal stability and low electrical resistivity– ERRATUM. Issue 4 (10th January 2014)

Record Type:: Journal Article
Title:: Barrierless Cu–Ni–Nb thin films on silicon with high thermal stability and low electrical resistivity– ERRATUM. Issue 4 (10th January 2014)
Main Title:: Barrierless Cu–Ni–Nb thin films on silicon with high thermal stability and low electrical resistivity– ERRATUM
Authors:: Li, Xiao Na
Zhao, Li Rong
Li, Zhen
Liu, Li Jun
Bao, Cui Min
Chu, Jinn P.
Dong, Chuang
Abstract:
Is Part Of:: Journal of materials research. Volume 29:Issue 4(2014)
Journal:: Journal of materials research
Issue:: Volume 29:Issue 4(2014)
Issue Display:: Volume 29, Issue 4 (2014)
Year:: 2014
Volume:: 29
Issue:: 4
Issue Sort Value:: 2014-0029-0004-0000
Page Start:: 605
Page End:: 605
Publication Date:: 2014-01-10
Subjects:: Materials -- Research -- Periodicals
620.1105
Journal URLs:: https://www.springer.com/journal/43578 ↗
http://journals.cambridge.org/action/displayJournal?jid=JMR ↗
http://link.springer.com/ ↗
http://www.mrs.org/ ↗
DOI:: 10.1557/jmr.2013.391 ↗
Languages:: English
ISSNs:: 0884-2914
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store
Ingest File:: 4837.xml