Incorporation of SiO2 and TiO2 additives into expanded polystyrene foam using physical vapour deposition technique. (September 2017)

• Record Type: Journal Article
• Authors: Varnagiris, Sarunas; Girdzevicius, Dalius; Urbonavicius, Marius; Milcius, Darius
• Is Part Of: Energy procedia. Volume 128(2017)
• Page Start: 525
• Page End: 532
• Publication Date: 2017-09
• Subjects: expanded polystyrene -- physical vapour deposition -- additives incorporation -- TiO2 -- SiO2; Power resources -- Congresses; Power resources -- Periodicals; Power resources; Conference proceedings; Periodicals; 333.7905
• DOI: 10.1016/j.egypro.2017.09.073
• Languages: English
• ISSNs: 1876-6102

Abstract

Abstract: This article analyses possibility to use physical vapour deposition (PVD) technique for incorporation of pure SiO2 and TiO2 additives into thermal sensitive polymer (expanded polystyrene). SiO2 and TiO2 films were deposited on non-expanded polystyrene (PS) beads. These beads were expanded and molded into one piece foam (expanded polystyrene (EPS)). During the expansion process, SiO2 and TiO2 films were fractured. SiO2 / TiO2 films after expansion were distributed with even regions around the expanded PS beads. Results showed that fractured SiO2 and TiO2 films were observed on EPS foam without any impurities. Such method could be used for pure additives incorporation into polymers, where relatively homogenous distribution of additives in the polymer bulk is required.