Cite
HARVARD Citation
Wang, X. et al. (2017). Mechanism on M (MNi, Mo, NiMo) as deep level impurity reducing the TCR of Si-rich CrSi resistive films. Superlattices and microstructures. pp. 217-228. [Online].
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Wang, X. et al. (2017). Mechanism on M (MNi, Mo, NiMo) as deep level impurity reducing the TCR of Si-rich CrSi resistive films. Superlattices and microstructures. pp. 217-228. [Online].