Influence of hydrogen etching on the adhesion of coated ferrous alloy by hydrogenated amorphous carbon deposited at low temperature. (October 2017)

• Record Type: Journal Article
• Authors: Crespi, A.E.; Leidens, L.M.; Aguzzoli, C.; Alvarez, F.; Figueroa, C.A.
• Is Part Of: Vacuum. Volume 144(2017)
• Page Start: 243
• Page End: 246
• Publication Date: 2017-10
• Subjects: Interlayer -- Hydrogen effect -- Adhesion -- Amorphous carbon -- PECVD -- Electrostatic confinement; Vacuum -- Periodicals; 621.55
• DOI: 10.1016/j.vacuum.2017.07.038
• Languages: English
• ISSNs: 0042-207X

Abstract

Abstract: Carbonaceous thin films show poor adhesion when deposited on steels. Chromium, titanium, and silicon-containing interlayers are generally used in order to prompt adhesion. This work shows a systematic study of the hydrogen effect on the physical-chemical properties of a-SiCx :H interlayers deposited by using hexamethyldisiloxane on AISI 4140 at low temperatures (85 °C–180 °C). In particular, the effect of the treatment on the adhesion of a-C:H thin films is reported. The results show that hydrogen radically modifies the tribological behavior inducing the adhesion of a-C:H thin films at temperatures as low as 85 °C. The adhesion's improvement is associated with the hydrogen chemical etching that seems to remove more silicon than carbon atoms from the outermost face of the a-SiCx :H interlayer promoting the formation of stronger carbon-carbon bonds. The results are also discussed showing the efficiency obtained by the use of the electrostatic confinement deposition technique. Highlights: a-C:H thin film adhesion at temperatures as low as 85 °C. Hydrogen plasma etching improving a-C:H thin film adhesion. Adhesion related to changes in the Si/C ratio at the outermost interface.