Large magnetoresistance of amorphous carbon films. (October 2017)

• Record Type: Journal Article
• Authors: Saleemi, Awais Siddique; Singh, Rajan; Sun, Wen; Luo, Zhaochu; Zhang, Xiaozhong
• Is Part Of: Carbon. Volume 122(2017)
• Page Start: 122
• Page End: 127
• Publication Date: 2017-10
• Subjects: Magnetoresistance -- Amorphous carbon -- Variable range hopping -- Localization length; Carbon -- Periodicals; Carbone -- Périodiques; Koolstof; Toepassingen; Electronic journals; 546.681
• DOI: 10.1016/j.carbon.2017.06.048
• Languages: English
• ISSNs: 0008-6223

Abstract

Abstract: Magnetoresistance (MR) of pure amorphous carbon thin films deposited by pulsed laser deposition at various deposition temperatures was studied. Maximum MR of 46% was observed at 2 K under the magnetic field of 7 T for the sample deposited at temperature of 500 °C. No tendency of MR saturation was observed up to 7 T. The MR decreases rapidly with the increase in measurement temperature and vanishes after 40 K. The transport mechanism of all the samples follow Efros-Shklovskii variable range hopping model. The characteristics temperature decreasing from 2540 K to 1290 K and localization length increasing from 5.3 nm to 10.7 nm with increasing fraction of C( sp 2 ) from 72% to 84%. The lower disorder degree may results in higher MR. Graphical abstract: