Cite
HARVARD Citation
Salhi, R. et al. (n.d.). Growth and Properties of Amorphous Erbium‐doped Aluminum‐yttrium Oxide Films Deposited by Aerosol‐UV‐Assisted MOCVD. Chemical vapor deposition. 21 (1), pp. 26-32. [Online].
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Salhi, R. et al. (n.d.). Growth and Properties of Amorphous Erbium‐doped Aluminum‐yttrium Oxide Films Deposited by Aerosol‐UV‐Assisted MOCVD. Chemical vapor deposition. 21 (1), pp. 26-32. [Online].