Transistor application of new picene-type molecules, 2, 9-dialkylated phenanthro[1, 2-b:8, 7-b′]dithiophenes. Issue 10 (30th January 2015)
- Record Type:
- Journal Article
- Title:
- Transistor application of new picene-type molecules, 2, 9-dialkylated phenanthro[1, 2-b:8, 7-b′]dithiophenes. Issue 10 (30th January 2015)
- Main Title:
- Transistor application of new picene-type molecules, 2, 9-dialkylated phenanthro[1, 2-b:8, 7-b′]dithiophenes
- Authors:
- Kubozono, Yoshihiro
Hyodo, Keita
Mori, Hiroki
Hamao, Shino
Goto, Hidenori
Nishihara, Yasushi - Abstract:
- Abstract : Field-effect transistors have been fabricated that use thin films of 2, 9-dialkylated phenanthro[1, 2- b :8, 7- b ′]dithiophenes (C n -PDTs), with the transistor based on a thin film of C12 -PDT showing a μ as high as ∼2 cm 2 V −1 s −1, which is promising for future practical electronics. Abstract : Field-effect transistors (FETs) have been fabricated with thin films of a series of 2, 9-dialkylated phenanthro[1, 2- b :8, 7- b ′]dithiophene derivatives (C n -PDTs). The FET characteristics of C n -PDT thin-film FETs with an SiO2 gate dielectric as well as high- k gate dielectrics were recorded, and the dependence of the field-effect mobility, μ, on the number ( n ) of carbon atoms in the alkyl chains was investigated, showing that the 2, 9-didodecylphenanthro[1, 2- b :8, 7- b ′]dithiophene (C12 -PDT) thin-film FET displays superior properties, with μ s as high as 1.8 cm 2 V −1 s −1 for the SiO2 gate dielectric and 2.2 cm 2 V −1 s −1 for the HfO2 gate dielectric. The average μ values, 〈 μ 〉, reach 1.1(5) and 1.8(6) cm 2 V −1 s −1, respectively, for the SiO2 and ZrO2 gate dielectrics. Low-voltage operation, showing an absolute average threshold voltage 〈| V th |〉 of ∼11 V, was implemented, together with the above high 〈 μ 〉 of ∼2 cm 2 V −1 s −1 . Also, a flexible FET was fabricated with a parylene gate dielectric. The results of this study show the potential of the C12 -PDT molecule for application in a high-performance transistor.
- Is Part Of:
- Journal of materials chemistry. Volume 3:Issue 10(2015)
- Journal:
- Journal of materials chemistry
- Issue:
- Volume 3:Issue 10(2015)
- Issue Display:
- Volume 3, Issue 10 (2015)
- Year:
- 2015
- Volume:
- 3
- Issue:
- 10
- Issue Sort Value:
- 2015-0003-0010-0000
- Page Start:
- 2413
- Page End:
- 2421
- Publication Date:
- 2015-01-30
- Subjects:
- Materials -- Periodicals
Chemistry, Analytic -- Periodicals
Optical materials -- Research -- Periodicals
Electronics -- Materials -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/tc# ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c4tc02413c ↗
- Languages:
- English
- ISSNs:
- 2050-7526
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5012.205300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 4446.xml