Plasmonic‐Tuned Flash Cu Nanowelding with Ultrafast Photochemical‐Reducing and Interlocking on Flexible Plastics. (29th May 2017)
- Record Type:
- Journal Article
- Title:
- Plasmonic‐Tuned Flash Cu Nanowelding with Ultrafast Photochemical‐Reducing and Interlocking on Flexible Plastics. (29th May 2017)
- Main Title:
- Plasmonic‐Tuned Flash Cu Nanowelding with Ultrafast Photochemical‐Reducing and Interlocking on Flexible Plastics
- Authors:
- Park, Jung Hwan
Han, Seungyong
Kim, Dongkwan
You, Byoung Kuk
Joe, Daniel J.
Hong, Sukjoon
Seo, Jeongmin
Kwon, Jinhyeong
Jeong, Chang Kyu
Park, Hong‐Jin
Kim, Taek‐Soo
Ko, Seung Hwan
Lee, Keon Jae - Abstract:
- Abstract : Herein, a high‐performance copper nanowire (Cu NW) network (sheet resistance ≈ 17 Ω sq −1, transmittance 88%) fabricated by plasmonic‐tuned flash welding (PFW) with ultrafast interlocking and photochemical reducing is reported, which greatly enhance the mechanical and chemical stability of Cu NWs. Xenon flash spectrum is tuned in an optimized distribution (maximized light intensity at 600 nm wavelength) through modulation of electron kinetic energy in the lamp by generating drift potential for preferential photothermal interactions. High‐intensity visible light is emitted by the plasmonic‐tuned flash, which strongly improves Cu nanowelding without oxidation. Near‐infrared spectrum of the flash induced an interlocking structure of NW/polyethylene terephthalate interface by exciting Cu NW surface plasmon polaritons (SPPs), increasing adhesion of the Cu nanonetwork by 208%. In addition, ultrafast photochemical reduction of Cu NWs is accomplished in air by flash‐induced electron excitations and relevant chemical reactions. The PFW effects of localized surface plasmons and SPPs on junction welding and adhesion strengthening of Cu network are theoretically studied as physical behaviors by finite‐difference time‐domain simulations. Finally, a transparent resistive memory and a touch screen panel are demonstrated by using the flash‐induced Cu NWs, showing versatile and practical uses of PFW‐treated Cu NW electrodes for transparent flexible electronics. Abstract :Abstract : Herein, a high‐performance copper nanowire (Cu NW) network (sheet resistance ≈ 17 Ω sq −1, transmittance 88%) fabricated by plasmonic‐tuned flash welding (PFW) with ultrafast interlocking and photochemical reducing is reported, which greatly enhance the mechanical and chemical stability of Cu NWs. Xenon flash spectrum is tuned in an optimized distribution (maximized light intensity at 600 nm wavelength) through modulation of electron kinetic energy in the lamp by generating drift potential for preferential photothermal interactions. High‐intensity visible light is emitted by the plasmonic‐tuned flash, which strongly improves Cu nanowelding without oxidation. Near‐infrared spectrum of the flash induced an interlocking structure of NW/polyethylene terephthalate interface by exciting Cu NW surface plasmon polaritons (SPPs), increasing adhesion of the Cu nanonetwork by 208%. In addition, ultrafast photochemical reduction of Cu NWs is accomplished in air by flash‐induced electron excitations and relevant chemical reactions. The PFW effects of localized surface plasmons and SPPs on junction welding and adhesion strengthening of Cu network are theoretically studied as physical behaviors by finite‐difference time‐domain simulations. Finally, a transparent resistive memory and a touch screen panel are demonstrated by using the flash‐induced Cu NWs, showing versatile and practical uses of PFW‐treated Cu NW electrodes for transparent flexible electronics. Abstract : Plasmonic‐tuned flash copper (Cu) nanowelding is developed for high‐performance Cu nanowires (NWs) with interlocking on plastics. In addition, rapid photochemical reduction of oxidized Cu NWs is demonstrated in air. Finally, a transparent resistive memory and a touch screen panel are fabricated by using the Cu NWs. … (more)
- Is Part Of:
- Advanced functional materials. Volume 27:Number 29(2017)
- Journal:
- Advanced functional materials
- Issue:
- Volume 27:Number 29(2017)
- Issue Display:
- Volume 27, Issue 29 (2017)
- Year:
- 2017
- Volume:
- 27
- Issue:
- 29
- Issue Sort Value:
- 2017-0027-0029-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-05-29
- Subjects:
- interlocking -- photoreducing -- plasmonic‐tuned flash copper nanowelding -- resistive memory -- touch screen panels
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201701138 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 2954.xml