Ga[OSi(OtBu)3]3·THF, a thermolytic molecular precursor for high surface area gallium-containing silica materials of controlled dispersion and stoichiometry. Issue 27 (17th June 2016)
- Record Type:
- Journal Article
- Title:
- Ga[OSi(OtBu)3]3·THF, a thermolytic molecular precursor for high surface area gallium-containing silica materials of controlled dispersion and stoichiometry. Issue 27 (17th June 2016)
- Main Title:
- Ga[OSi(OtBu)3]3·THF, a thermolytic molecular precursor for high surface area gallium-containing silica materials of controlled dispersion and stoichiometry
- Authors:
- Dombrowski, James P.
Johnson, Gregory R.
Bell, Alexis T.
Tilley, T. Don - Abstract:
- Abstract : Ga[OSi(O t Bu)3 ]3 ·THF was used as the first thermolytic single-source molecular precursor to generate gallium-containing silicas. Abstract : The molecular precursor tris[(tri- tert -butoxy)siloxy]gallium, as the tetrahydrofuran adduct Ga[OSi(O t Bu)3 ]3 ·THF (1 ), was synthesized via the salt metathesis reaction of gallium trichloride with NaOSi(O t Bu)3 . This complex serves as a model for isolated gallium in a silica framework. Complex1 decomposes thermally in hydrocarbon solvent, eliminating isobutylene, water, and tert -butanol to generate high surface area gallium-containing silica at low temperatures. When thermal decomposition was performed in the presence of P-123 Pluronic as a templating agent the generated material displayed uniform vermicular pores. Textural mesoporosity was evident in untemplated material. Co-thermolysis of1 with HOSi(O t Bu)3 in the presence of P-123 Pluronic led to materials with Ga : Si ratios ranging from 1 : 3 to 1 : 50, denotedUCB1-GaSi 3, UCB1-GaSi 10, UCB1-GaSi 20 andUCB1-GaSi 50 . After calcination at 500 °C these materials exhibited decreasing surface areas and broadening pore distributions with increasing silicon content, indicating a loss of template effects. The position and dispersion of the gallium inUCB1-GaSi materials was investigated using 71 Ga MAS-NMR, powder XRD, and STEM/EDS elemental mapping. The results indicate a high degree of gallium dispersion in all samples, with gallium oxide clusters or oligomersAbstract : Ga[OSi(O t Bu)3 ]3 ·THF was used as the first thermolytic single-source molecular precursor to generate gallium-containing silicas. Abstract : The molecular precursor tris[(tri- tert -butoxy)siloxy]gallium, as the tetrahydrofuran adduct Ga[OSi(O t Bu)3 ]3 ·THF (1 ), was synthesized via the salt metathesis reaction of gallium trichloride with NaOSi(O t Bu)3 . This complex serves as a model for isolated gallium in a silica framework. Complex1 decomposes thermally in hydrocarbon solvent, eliminating isobutylene, water, and tert -butanol to generate high surface area gallium-containing silica at low temperatures. When thermal decomposition was performed in the presence of P-123 Pluronic as a templating agent the generated material displayed uniform vermicular pores. Textural mesoporosity was evident in untemplated material. Co-thermolysis of1 with HOSi(O t Bu)3 in the presence of P-123 Pluronic led to materials with Ga : Si ratios ranging from 1 : 3 to 1 : 50, denotedUCB1-GaSi 3, UCB1-GaSi 10, UCB1-GaSi 20 andUCB1-GaSi 50 . After calcination at 500 °C these materials exhibited decreasing surface areas and broadening pore distributions with increasing silicon content, indicating a loss of template effects. The position and dispersion of the gallium inUCB1-GaSi materials was investigated using 71 Ga MAS-NMR, powder XRD, and STEM/EDS elemental mapping. The results indicate a high degree of gallium dispersion in all samples, with gallium oxide clusters or oligomers present at higher gallium content. … (more)
- Is Part Of:
- Dalton transactions. Volume 45:Issue 27(2016)
- Journal:
- Dalton transactions
- Issue:
- Volume 45:Issue 27(2016)
- Issue Display:
- Volume 45, Issue 27 (2016)
- Year:
- 2016
- Volume:
- 45
- Issue:
- 27
- Issue Sort Value:
- 2016-0045-0027-0000
- Page Start:
- 11025
- Page End:
- 11034
- Publication Date:
- 2016-06-17
- Subjects:
- Chemistry, Inorganic -- Periodicals
Chemistry, Physical and theoretical -- Periodicals
Chemistry, Inorganic -- Periodicals
546.05 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/dt#!issueid=dt043040&type=current&issnprint=1477-9226 ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c6dt01676f ↗
- Languages:
- English
- ISSNs:
- 1477-9226
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3517.830000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 2909.xml