The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering. (March 2016)

• Record Type: Journal Article
• Authors: Depla, D.; Besnard, A.; Lamas, J.
• Is Part Of: Vacuum. Volume 125(2016)
• Page Start: 118
• Page End: 122
• Publication Date: 2016-03
• Subjects: Yttria-stabilized zirconia -- Dual magnetron sputtering -- Modelling -- Monte Carlo; Vacuum -- Periodicals; 621.55
• DOI: 10.1016/j.vacuum.2015.12.013
• Languages: English
• ISSNs: 0042-207X

Abstract

Abstract: Mixed oxide thin films, such as yttria-stabilized zirconia, deposited by dual reactive magnetron sputtering on a non-rotating substrate show a typical microstructure of bended, or tilted columns. Two effects define the tilt. The first effect is the compositional gradient over each column which results in a different lattice spacing. To accommodate this difference, the column bends. As such, the chemical composition has a major influence on the final columnar tilt. The second effect is ballistic shadowing which is controlled by the pressure-distance product. At higher pressure-distances, this second effect plays a more prominent role, and a different behaviour of the columnar tilt as a function of the film composition is noticed. The experimental trends can be understood by the use of a particle trajectory code which provides the angular and energy distribution of the atoms to a ballistic aggregation Monte Carlo code simulating the resulting microstructure. Highlights: Overview of the microstructure of thin films deposited by dual magnetron sputtering. Correlation between microstructure and pressure for yttria stabilized zirconia. Combination of Monte Carlo particle trajectory and ballistic modelling.