Water Vapor Treatment for Decreasing the Adhesion between Vertically Aligned Carbon Nanotubes and the Growth Substrate1. Issue 7 (7th August 2013)
- Record Type:
- Journal Article
- Title:
- Water Vapor Treatment for Decreasing the Adhesion between Vertically Aligned Carbon Nanotubes and the Growth Substrate1. Issue 7 (7th August 2013)
- Main Title:
- Water Vapor Treatment for Decreasing the Adhesion between Vertically Aligned Carbon Nanotubes and the Growth Substrate1
- Authors:
- Yao, Yagang
Moon, Kyoung‐Sik
McNamara, Andrew
Wong, Ching‐ping - Abstract:
- Abstract : A simple way to decrease the adhesion between vertically aligned carbon nanotubes and the growth substrate is reported. The decreased adhesion helps the transfer of VACNTs grown from the BM CVD system onto specific substrates. Using this method, a CNT‐based thermal interface material, which is a Si/CNT/Cu tri‐layer structure, is made. A low thermal resistance of ∼10.5 mm 2 K W −1 is achieved.
- Is Part Of:
- Chemical vapor deposition. Volume 19:Issue 7/9(2013:Sep.)
- Journal:
- Chemical vapor deposition
- Issue:
- Volume 19:Issue 7/9(2013:Sep.)
- Issue Display:
- Volume 19, Issue 7/9 (2013)
- Year:
- 2013
- Volume:
- 19
- Issue:
- 7/9
- Issue Sort Value:
- 2013-0019-NaN-0000
- Page Start:
- 224
- Page End:
- 227
- Publication Date:
- 2013-08-07
- Subjects:
- Chemical vapor deposition -- Periodicals
671.735 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/cvde.201304319 ↗
- Languages:
- English
- ISSNs:
- 0948-1907
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3152.800000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 2842.xml