Cu Diffusion‐Driven Dynamic Modulation of the Electrical Properties of Amorphous Oxide Semiconductors. (3rd May 2017)
- Record Type:
- Journal Article
- Title:
- Cu Diffusion‐Driven Dynamic Modulation of the Electrical Properties of Amorphous Oxide Semiconductors. (3rd May 2017)
- Main Title:
- Cu Diffusion‐Driven Dynamic Modulation of the Electrical Properties of Amorphous Oxide Semiconductors
- Authors:
- Yeon, Han‐Wool
Jo, Janghyun
Song, Hochul
Kang, Youngho
Na, Sekwon
Yoo, Hyobin
Lee, Seung‐Yong
Cho, Haelim
Kang, Ho‐Young
Jung, Jung‐Kyu
Han, Seungwu
Kim, Miyoung
Joo, Young‐Chang - Abstract:
- Abstract : The exact role of Cu in the electrical properties of amorphous oxide semiconductors (AOSs) has been unclear, even though Cu has been the key element for the p‐type characteristics of crystalline oxide semiconductors. Here, the dynamic changes, determined by diffusion kinetics, in the effect of Cu on the electrical properties of amorphous InGaZnO (a‐IGZO) are revealed. In the early stage of annealing, Cu dominantly diffuses into a‐IGZO through the free volume and acts as a mobile electron donor, which generates a resistive switching (RS) behavior related to the conductive filaments (CFs). With further annealing, substitutional Cu becomes predominant via In sites. After annealing, supersaturated Cu forms nonuniform, crystalline CuInO clusters in a‐IGZO, which decrease the electrical conductivity of a‐IGZO and deteriorate the CF‐based RS performance. The findings reveal Cu diffusion mechanisms and the role of Cu in the electrical properties of AOSs dependent on the structural location and provide guidelines for modulating the RS characteristics of AOSs through Cu diffusion control. Abstract : The effects of dynamic copper diffusion on the electrical properties of amorphous oxide semiconductors (AOSs) are investigated. As the dominant copper diffusion site is altered from the free volume to the substitutional sites as a function of the annealing conditions, the electrical conductivity and the resistive switching characteristics of AOSs are dynamically altered.
- Is Part Of:
- Advanced functional materials. Volume 27:Number 25(2017)
- Journal:
- Advanced functional materials
- Issue:
- Volume 27:Number 25(2017)
- Issue Display:
- Volume 27, Issue 25 (2017)
- Year:
- 2017
- Volume:
- 27
- Issue:
- 25
- Issue Sort Value:
- 2017-0027-0025-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-05-03
- Subjects:
- amorphous oxide semiconductors -- Cu diffusion -- Cu doping -- resistive switching -- structural locations
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201700336 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 341.xml