Correction: Spatial control of direct chemical vapor deposition of graphene on silicon dioxide by directional copper dewetting. Issue 48 (9th June 2017)

Record Type:: Journal Article
Title:: Correction: Spatial control of direct chemical vapor deposition of graphene on silicon dioxide by directional copper dewetting. Issue 48 (9th June 2017)
Main Title:: Correction: Spatial control of direct chemical vapor deposition of graphene on silicon dioxide by directional copper dewetting
Authors:: van den Beld, Wesley T. E.
van den Berg, Albert
Eijkel, Jan C. T.
Abstract:: Abstract : Correction for 'Spatial control of direct chemical vapor deposition of graphene on silicon dioxide by directional copper dewetting' by Wesley T. E. van den Beld et al., RSC Adv., 2016, 6, 89380–89386.
Is Part Of:: RSC advances. Volume 7:Issue 48(2017)
Journal:: RSC advances
Issue:: Volume 7:Issue 48(2017)
Issue Display:: Volume 7, Issue 48 (2017)
Year:: 2017
Volume:: 7
Issue:: 48
Issue Sort Value:: 2017-0007-0048-0000
Page Start:: 29926
Page End:: 29926
Publication Date:: 2017-06-09
Subjects:: Chemistry -- Periodicals
540.5
Journal URLs:: http://pubs.rsc.org/en/Journals/JournalIssues/RA ↗
http://www.rsc.org/ ↗
DOI:: 10.1039/c7ra90069d ↗
Languages:: English
ISSNs:: 2046-2069
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - 8036.750300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store
Ingest File:: 2777.xml