Fabrication of directional nanopillars with high-aspect-ratio using a stretching imprint process with a microcavity mold. Issue 6 (18th November 2016)

• Record Type: Journal Article
• Authors: Jiang, Weitao; Lei, Biao; Liu, Hongzhong; Niu, Dong; Zhao, Tingting; Chen, Bangdao; Yin, Lei; Shi, Yongsheng; Liu, Xiaokang
• Is Part Of: Nanoscale. Volume 9:Issue 6(2017)
• Page Start: 2172
• Page End: 2177
• Publication Date: 2016-11-18
• Subjects: Nanoscience -- Periodicals; Nanotechnology -- Periodicals; 620.505
• DOI: 10.1039/c6nr06957f
• Languages: English
• ISSNs: 2040-3364

Abstract

Abstract : A simple stretching imprint process to prepare controllable directional (30°–90° in a slanted angle) nanopillars (200–800 nm in diameter) with high aspect ratio (>30) using a microcavity mold is proposed. Abstract : Directional nanopillars with high-aspect-ratio have wide applications in home or industrial appliances and biomimetic robots. Their fabrication, however, is a challenge for conventional methods. In this study, we propose a simple stretching imprint process to prepare controllable directional (30°–90° in a slanted angle) nanopillars (200–800 nm in diameter) with high aspect ratio (>30) using a microcavity mold, beyond the conventional nanoimprint process, for 1 : 1 pattern transfer from the mold to the replica. The mechanism of the stretching imprint process is further investigated, and a rheology model for the filament evolution during the stretching process is established, which clearly shows that the aspect-ratio, diameter in submicrons, slanted angle, and also the tip profile of the free-standing nanopillars can be easily controlled by the imprint process using a microcavity mold. Further experiments indicate that the fabricated directional free-standing nanopillars show strong friction anisotropy, which may find applications in biomimetic studies.