N‐Arylsulfonimides as Photoinitiators for Cationic Polymerization of Epoxy Sol‐Gel Materials. Issue 13 (5th May 2017)

• Record Type: Journal Article
• Authors: Torti, Edoardo; Protti, Stefano; Fagnoni, Maurizio; Della Giustina, Gioia
• Is Part Of: ChemistrySelect. Volume 2:Issue 13(2017)
• Page Start: 3633
• Page End: 3636
• Publication Date: 2017-05-05
• Subjects: organic-inorganic hybrid materials -- photolithography -- ring opening polymerization -- sol-gel processes -- sulfonimides; Chemistry -- Periodicals; 540.5
• DOI: 10.1002/slct.201700626
• Languages: English
• ISSNs: 2365-6549

Abstract

Abstract: N ‐arylsulfonimides, a new class of non‐ionic photoacid generators (PAGs) able to release two equivalents of strong sulfonic acids per equivalent of PAG are employed in solid state polymerization within an epoxy based hybrid sol‐gel system. Thus, epoxy ring opening reactions were successfully induced by UV light exposure of sol‐gel films and the organic network progression was followed by infrared spectroscopy. Polymerization degrees reached with N ‐arylsulfonimides were close to that obtained with a commercial PAG (4‐phenylthiophenyl)diphenylsulfonium triflate, DPST). Different micrometric patterns with satisfactory pattern definition were achieved by UV lithography of sol‐gel films containing a N ‐arylsulfonimide. These new PAGs are therefore promising photoinitiators to be applied in photopolymerization processes and microelectronics. Abstract : Macro‐acidity for micro‐patterns. N ‐arylsulfonimides able to photorelease up to two equivalents of sulfonic acids were used in the polymerization of epoxy‐based materials. Micrometric patterns were obtained by UV lithography exploiting such systems, opening the way for the use of sulfonimides in microelectronics.