Nanofabrication and characterization of a grating‐based condenser for uniform illumination with hard X‐rays. (7th April 2017)

• Record Type: Journal Article
• Authors: Liu, Jianpeng; Li, Xin; Chen, Shuo; Zhang, Sichao; Xie, Shanshan; Xu, Chen; Chen, Yifang; Deng, Biao; Mao, Chenwen
• Is Part Of: Journal of synchrotron radiation. Volume 24:Part 3(2017)
• Page Start: 595
• Page End: 599
• Publication Date: 2017-04-07
• Subjects: condenser -- uniform illumination -- gratings -- nanofabrication -- hard X‐ray optics; Synchrotron radiation -- Periodicals; Free electron lasers -- Periodicals; 539.73505
• DOI: 10.1107/S1600577517002247
• Languages: English
• ISSNs: 0909-0495

Abstract

Abstract : An X‐ray condenser based on gratings has been successfully fabricated and its optical character measured. Abstract : In the development of full‐field transmission X‐ray microscopy for basic study in science and technology, a condenser capable of providing intense illumination with high uniformity and stability on tested specimens in order to achieve high‐quality images is essential. The latest design of a square‐shaped condenser based on diffractive gratings has demonstrated promising uniformity in illumination. This paper describes in more detail the development of such a beam shaper for hard X‐rays at 10 keV with regard to its design, manufacture and optical characterization. The effect of the grating profile on the diffracted intensity has been theoretically predicted by numerical simulation using the finite‐difference time‐domain method. Based on this, the limitations of the grating‐based condenser are discussed.