Cite
HARVARD Citation
Du, Y. et al. (2017). A novel tri-layer nanoindentation method to measure the mechanical properties of a porous brittle ultra-low-k dielectric thin film. Extreme mechanics letters. pp. 100-107. [Online].
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Du, Y. et al. (2017). A novel tri-layer nanoindentation method to measure the mechanical properties of a porous brittle ultra-low-k dielectric thin film. Extreme mechanics letters. pp. 100-107. [Online].