Highly Manufacturable Deep (Sub‐Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego‐Like Silicon Electronics. Issue 16 (1st February 2017)
- Record Type:
- Journal Article
- Title:
- Highly Manufacturable Deep (Sub‐Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego‐Like Silicon Electronics. Issue 16 (1st February 2017)
- Main Title:
- Highly Manufacturable Deep (Sub‐Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego‐Like Silicon Electronics
- Authors:
- Ghoneim, Mohamed Tarek
Hussain, Muhammad Mustafa - Abstract:
- Abstract : A highly manufacturable deep reactive ion etching based process involving a hybrid soft/hard mask process technology shows high aspect ratio complex geometry Lego‐like silicon electronics formation enabling free‐form (physically flexible, stretchable, and reconfigurable) electronic systems.
- Is Part Of:
- Small. Volume 13:Issue 16(2017)
- Journal:
- Small
- Issue:
- Volume 13:Issue 16(2017)
- Issue Display:
- Volume 13, Issue 16 (2017)
- Year:
- 2017
- Volume:
- 13
- Issue:
- 16
- Issue Sort Value:
- 2017-0013-0016-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-02-01
- Subjects:
- deep reactive ion etching -- flexible electronics -- silicon electronics -- soft/hard mask -- microfabrication
Nanotechnology -- Periodicals
Nanoparticles -- Periodicals
Microtechnology -- Periodicals
620.5 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1613-6829 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/smll.201601801 ↗
- Languages:
- English
- ISSNs:
- 1613-6810
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8309.952000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 43.xml