Achieve atomic resolution in in situ S/TEM experiments to examine complex interface structures in nanomaterials. Issue 2 (April 2017)

• Record Type: Journal Article
• Authors: Jinschek, Joerg R.
• Is Part Of: Current opinion in solid state & materials science. Volume 21:Issue 2(2017)
• Page Start: 77
• Page End: 91
• Publication Date: 2017-04
• Subjects: Advanced electron microscopy -- In situ electron microscopy -- Atomic resolution -- Interface; Materials science -- Periodicals; Solid state physics -- Periodicals; 620.11
• DOI: 10.1016/j.cossms.2016.05.010
• Languages: English
• ISSNs: 1359-0286

Abstract

Highlights: S/TEM is achieving resolution and sensitivity in imaging and spectroscopy. Atomic scale interface analysis has been shown in in situ characterization studies. Further progress in in situ S/TEM technology is still desired. Developments focus on reaching highest possible resolution in non-invasive studies. Abstract: Characterization methods utilizing Scanning / Transmission Electron Microscopes have become routine techniques to investigate interface structures in nanomaterials. High resolution imaging methods reveals atomic structure; while spectroscopy gives additional access to elemental distribution and chemical bonding. Focus behind these developments is the research on nanomaterial-based technologies. Current trends in S/TEM research focus on extending atomic scale characterization capabilities from static to dynamic studies to understand in more detail the link between structure and its evolution vs. unique properties directly on its characteristic length scale. Progress in recent research is briefly reviewed to highlight the potential when using latest S/TEM methodology optimized for atomic scale investigations and how this can be extended to in situ studies of interfacial effects, followed by comments on how to achieve and maintain highest possible resolution & sensitivity when keeping the effect of electron beam under control during these atomic-scale in situ experiments.