Structure and electrical properties of pure and yttrium-doped HfO2 films by chemical solution deposition through layer by layer crystallization process. (15th April 2017)
- Record Type:
- Journal Article
- Title:
- Structure and electrical properties of pure and yttrium-doped HfO2 films by chemical solution deposition through layer by layer crystallization process. (15th April 2017)
- Main Title:
- Structure and electrical properties of pure and yttrium-doped HfO2 films by chemical solution deposition through layer by layer crystallization process
- Authors:
- Liang, Hailong
Xu, Jin
Zhou, Dayu
Wang, Xuexia
Liu, Xiaohua
Chu, Shichao
Liu, Xiaoying - Abstract:
- Abstract: Pure and yttrium doped HfO2 thin films were fabricated on Si (100) substrates by chemical solution deposition through a layer by layer crystallization process. We systematically investigated the effects of thickness and Y doped concentration on structure and electrical properties of the HfO2 films. Results revealed that 4 nm thick undoped HfO2 was crystallized into a t/c-phase due to the surface energy effect, and this higher symmetry phase could be retained up to a film thickness of 16 nm through the layer by layer crystallization process. This layer by layer crystallization process also required less Y doping to stabilize t/c-HfO2 in thick films. The films showed a high dielectric constant about 42, low leakage current density of about 10 − 7 A/cm 2 (at 1 MV/cm) and a breakdown field up to 5 MV/cm. Considering the cost-effective deposition technique and good electrical properties, these films would be suitable for insulator applications in microelectronic devices. Graphical abstract: Highlights: A layer by layer crystallization process for pure and yttrium doped HfO2 films was studied. The films showed a high dielectric constant, low leakage current density and a high breakdown field. The less yttrium doping to stabilize higher symmetry phase was attributed to surface energy effect.
- Is Part Of:
- Materials & design. Volume 120(2017)
- Journal:
- Materials & design
- Issue:
- Volume 120(2017)
- Issue Display:
- Volume 120, Issue 2017 (2017)
- Year:
- 2017
- Volume:
- 120
- Issue:
- 2017
- Issue Sort Value:
- 2017-0120-2017-0000
- Page Start:
- 376
- Page End:
- 381
- Publication Date:
- 2017-04-15
- Subjects:
- Pure and yttrium-doped HfO2 -- Layer by layer crystallization process -- Thin films -- Electrical properties
Materials -- Periodicals
Engineering design -- Periodicals
Matériaux -- Périodiques
Conception technique -- Périodiques
Electronic journals
620.11 - Journal URLs:
- http://catalog.hathitrust.org/api/volumes/oclc/9062775.html ↗
http://www.sciencedirect.com/science/journal/02641275 ↗
http://www.sciencedirect.com/science/journal/02613069 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.matdes.2017.02.019 ↗
- Languages:
- English
- ISSNs:
- 0264-1275
- Deposit Type:
- Legaldeposit
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- British Library DSC - 5393.974000
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