Correction: Plasma enhanced atomic layer deposition of Ga2O3 thin films. Issue 2 (2nd December 2014)
- Record Type:
- Journal Article
- Title:
- Correction: Plasma enhanced atomic layer deposition of Ga2O3 thin films. Issue 2 (2nd December 2014)
- Main Title:
- Correction: Plasma enhanced atomic layer deposition of Ga2O3 thin films
- Authors:
- Ramachandran, Ranjith K.
Dendooven, Jolien
Botterman, Jonas
Sree, Sreeprasanth Pulinthanathu
Poelman, Dirk
Martens, Johan A.
Poelman, Hilde
Detavernier, Christophe - Abstract:
- Abstract : Correction for 'Plasma enhanced atomic layer deposition of Ga2 O3 thin films' by Ranjith K. Ramachandran et al., J. Mater. Chem. A, 2014, 2, 19232–19238.
- Is Part Of:
- Journal of materials chemistry. Volume 3:Issue 2(2015)
- Journal:
- Journal of materials chemistry
- Issue:
- Volume 3:Issue 2(2015)
- Issue Display:
- Volume 3, Issue 2 (2015)
- Year:
- 2015
- Volume:
- 3
- Issue:
- 2
- Issue Sort Value:
- 2015-0003-0002-0000
- Page Start:
- 916
- Page End:
- 916
- Publication Date:
- 2014-12-02
- Subjects:
- Materials -- Research -- Periodicals
Chemistry, Analytic -- Periodicals
Environmental sciences -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/ta ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c4ta90219j ↗
- Languages:
- English
- ISSNs:
- 2050-7488
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5012.205100
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 2692.xml