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HARVARD Citation
Schilirò, E. et al. (2017). Effect of SiO2 interlayer on the properties of Al2O3 thin films grown by plasma enhanced atomic layer deposition on 4H‐SiC substrates. Physica status solidi. 214 (4), p. n/a. [Online].
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Schilirò, E. et al. (2017). Effect of SiO2 interlayer on the properties of Al2O3 thin films grown by plasma enhanced atomic layer deposition on 4H‐SiC substrates. Physica status solidi. 214 (4), p. n/a. [Online].