Patterning Anodic Porous Alumina with Resist Developers for Patterned Nanowire Formation. Issue 1785 (2015)

• Record Type: Journal Article
• Authors: Lee, SeungYeon.; Wratkowski, Daniel; Cho, Jeong-Hyun
• Editors: Arbiol, J.; Fontcuberta i Morral, A.; Filler, M.A.; Dick, K.A.; Xiong, Q.H.
• Is Part Of: MRS proceedings. Issue 1785(2015)
• Page Start: 13
• Page End: 18
• Publication Date: 2015
• Subjects: nanoscale, -- nanostructure, -- semiconducting; Electrical engineering -- Congresses; Physics -- Congresses; Materials -- Research -- Congresses; Materials science -- Congresses; 620.11
• DOI: 10.1557/opl.2015.566
• Languages: English
• ISSNs: 0272-9172

Abstract

ABSTRACT: Formation of patterned metal and semiconductor (e.g. silicon) nanowires is achieved using anodic aluminum oxide (AAO) templates with porous structures of different heights resulting from an initial step difference made by etching the aluminum (Al) thin film with a photoresist developer prior to the anodization process. This approach allows for the growth of vertically aligned nanowire arrays on a metal substrate, instead of an oriented semiconductor substrate, using an electroplating or a chemical vapor deposition (CVD) process. The vertically aligned metal and semiconductor nanowires defined on a metal substrate could be applied to the realization of vertical 3D transistors, field emission devices, or nano-micro sensors for biological applications.