Cite
HARVARD Citation
Kuisseu, P. et al. (2016). Wafering of ultra‐thin silicon substrates by MeV hydrogen implantation: effects of fluence and energy. Physica status solidi. 13 (10), pp. 798-801. [Online].
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Kuisseu, P. et al. (2016). Wafering of ultra‐thin silicon substrates by MeV hydrogen implantation: effects of fluence and energy. Physica status solidi. 13 (10), pp. 798-801. [Online].