Direct Photoalignment and Optical Patterning of Molecular Thin Films. Issue 6 (1st December 2016)

• Record Type: Journal Article
• Authors: Pithan, Linus; Beyer, Paul; Bogula, Laura; Zykov, Anton; Schäfer, Peter; Rawle, Jonathan; Nicklin, Chris; Opitz, Andreas; Kowarik, Stefan
• Is Part Of: Advanced materials. Volume 29:Issue 6(2017)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2016-12-01
• Subjects: direct photolithographic patterning -- excitonic absorption -- molecular photoalignment -- organic thin film growth -- X‐ray diffraction; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201604382
• Languages: English
• ISSNs: 0935-9648

Abstract

Abstract : A novel strategy for direct photoalignment of molecular materials using optothermal re‐orientation is introduced. Photoalignment for molecular materials such as the organic semiconductor tetracene is shown, without relying on additional photoreactive dopants or alignment layers. Patterning and polarized light emission, e.g., for polarized organic light emitting diodes is demonstrated.