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HARVARD Citation
Zhang, L. et al. (2017). ALD preparation of high-k HfO2 thin films with enhanced energy density and efficient electrostatic energy storage. RSC advances. 7 (14), pp. 8388-8393. [Online].
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Zhang, L. et al. (2017). ALD preparation of high-k HfO2 thin films with enhanced energy density and efficient electrostatic energy storage. RSC advances. 7 (14), pp. 8388-8393. [Online].