Cite
HARVARD Citation
Lundy, R. et al. (2017). Controlled solvent vapor annealing of a high χ block copolymer thin film. Physical chemistry chemical physics. 19 (4), pp. 2805-2815. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Lundy, R. et al. (2017). Controlled solvent vapor annealing of a high χ block copolymer thin film. Physical chemistry chemical physics. 19 (4), pp. 2805-2815. [Online].