Thermal stability of Al-Si12at.% nano-alloys confined between AlN layers in a nanomultilayer configuration. (15th March 2017)

• Record Type: Journal Article
• Authors: Lipecka, Joanna; Janczak-Rusch, Jolanta; Lewandowska, Malgorzata; Andrzejczuk, Mariusz; Richter, Gunther; Jeurgens, Lars P.H.
• Is Part Of: Scripta materialia. Number 130(2017)
• Page Start: 210
• Page End: 213
• Publication Date: 2017-03-15
• Subjects: Metastable phases -- Heterogeneous nucleation of phase transformations -- Melting -- Multilayer thin films -- Melting point depression; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2016.12.016
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: Nanomultilayers (NMLs) are envisaged for joining miniaturized and heat-sensitive components at ever-reduced temperatures. Investigation of the thermal stability of bulk-eutectic Al-Si12at.% nanolayers, confined between AlN barriers in a NML configuration, evidences the onset of phase separation of the supersaturated Al-Si solid solution into domains of pure Al and pure Si at around 200 °C. The phase-separated, but still nano-confined Al-Si nanolayers develop large in-plane compressive stresses upon further heating, which invoke extensive mass transport of both Si (by solid-state diffusion at T > 200 °C) and liquid Al (by heterogeneous contact melting at 300 < T < 400 °C) to the NML surface. Graphical abstract: The intrinsic thermal instability of nano-confined alloys may invoke a significant melting point depression, which may be exploited for joining miniaturized and heat-sensitive components at ever-lower temperatures.