Advances in the Application of Atomic Layer Deposition for Organometal Halide Perovskite Solar Cells. Issue 21 (1st September 2016)

• Record Type: Journal Article
• Authors: Deng, Kaimo; Li, Liang
• Is Part Of: Advanced materials interfaces. Volume 3:Issue 21(2016)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2016-09-01
• Subjects: atomic layer deposition -- electron transport layers -- interface -- perovskite solar cells -- stability; Materials science -- Periodicals; 620.11
• DOI: 10.1002/admi.201600505
• Languages: English
• ISSNs: 2196-7350

Abstract

Abstract : Organometal halide perovskite solar cells have undergone an unprecedented development as one of the most promising photovoltaic devices for the future. The conversion efficiency of perovskite solar cells has reached over 20% which renders it a position to compete with traditional crystalline silicon solar cells. However, the conversion efficiency still has room to be improved, and the device stability must be addressed to achieve excellent reproducibility and long lifetime. Atomic layer deposition (ALD) is becoming a powerful technology to deposit high‐quality thin film with good accuracy and low temperature, which may help to resolve the challenges remained in perovskite solar cells. This review will highlight the key developments using ALD in synthesizing basic building blocks and optimizing solar cell performances. Finally, the challenges faced by the application of ALD in perovskite solar cells are discussed. Abstract : Atomic layer deposition (ALD) can deposit high‐quality compact thin films with good accuracy and low temperature, which may help to solve the challenges related to power conversion efficiency and stability of organometal halide perovskite solar cells. This review highlights the key developments using ALD in synthesizing basic building blocks and optimizing perovskite solar cell performances.