Etching treatment of vertical WO3 nanoplates as a photoanode for enhanced photoelectrochemical performance. Issue 72 (19th July 2016)

• Record Type: Journal Article
• Authors: Zhao, Zhefei; Butburee, Teera; Lyv, Miaoqiang; Peerakiatkhajohn, Piangjai; Wang, Songcan; Wang, Lianzhou; Zheng, Huajun
• Is Part Of: RSC advances. Volume 6:Issue 72(2016)
• Page Start: 68204
• Page End: 68210
• Publication Date: 2016-07-19
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c6ra11750c
• Languages: English
• ISSNs: 2046-2069

Abstract

Abstract : An innovative etching method was developed to increase surface voids, active crystal facets and surface groups, which led to improved photocurrent performance. Abstract : Vertically grown WO3 nanoplates (WO3 NP) were successfully fabricated by a one-step hydrothermal process using citric acid as a structure directing agent. An innovative etching method was developed to obtain increased surface voids, active crystal facets and surface groups simultaneously, which led to a remarkably improved photocurrent density of ∼1.2 mA cm −2 at 1.23 V vs. RHE, compared to 0.97 mA cm −2 of pristine WO3 . Incident photon to current efficiency (IPCE) measurements also displayed a substantive increase of photoresponse in the intrinsic absorption range. Interestingly, a lower onset potential can be obtained after etching which is caused by the change of conduction and valence band positions. Moreover, the photoelectrocatalytic activity of WO3 for degrading methylene blue (MB) was also evaluated. This effective design could provide a promising method to enhance the efficiency of photoelectrochemical performance based on WO3 photoanodes.